Electromagnetic Effects in Capacitively Coupled Plasmas

Abstract: Following requirements of the plasma processing industry for increasing throughput, capacitively coupled plasma reactors with large area electrodes driving by very high frequency sources have been proposed. However, such reactors with plasmas inside support modes which can negatively influence the uniformity in the ion fluxes or the average energy of the ions impinging on the substrates, which is an essential requirement of the industry. It is shown when the popular electrostatic approximation used for description of the fields in capacitively coupled plasmas (CCP) breaks down and when these modes must be treated electromagnetically. Influence of the modes on the essential parameters of the CCP discharges is discussed. A few techniques for avoiding excitation of the modes leading to the undesired nonuniformities are mentioned. Results of several experiments studying such plasma discharges are briefly reviewed.