Possible Electrochemical Origin of Ferroelectricity in HfO2 Thin Films

Abstract: Recent observations of unusual ferroelectricity in thin films of HfO_2 and related materials have attracted broad interest to the materials and led to the emergence of a number of competing models for observed behaviors. Here we develop the electrochemical mechanism of observed ferroelectric-like behaviors, namely the collective phenomena of elastic and electric dipoles originated from oxygen vacancies formation in the vicinity of film surfaces, as well as from grain boundaries and other types of inhomogeneities inside the film. The ferroelectric phase is induced by the "electrochemical" coupling, that is the joint action of the omnipresent electrostriction and "chemical" pressure, which lead to the sign change of the positive coefficient alfa in the quadratic term alfa*P^2 in the order-disorder type thermodynamic functional depending on polarization P. Negative coefficient alfa becomes the driving force of the transition to the long-range ordered ferroelectric phase with the spontaneous polarization P in the direction normal to the film surface. Using the above ideas, we estimated that the reversible ferroelectric polarization, as high as (0.05 - 0.2) C/m^2, can be induced by oxygen vacancies in HfO_2 films of thickness less than (20 - 30) nm. Semi-quantitative agreement with available experimental data is demonstrated.