Map the E–T boundary for nucleation-limited vs. domain-wall propagation in CIPS
Determine whether monolayer CuInP2S6 (CIPS) exhibits a crossover from independent local Cu-site flipping (nucleation-limited switching) to sequential domain wall propagation when temperature is lowered and electric field strength is increased, and map the boundary separating these regimes in electric field–temperature parameter space.
References
This raises the question of whether CIPS, despite the NLS-like behavior reported at elevated temperatures, can access a more correlated wall-propagation regime under different conditions—specifically, whether lowering temperature to suppress stochastic thermal nucleation while increasing the electric field can drive a crossover from independent local flipping to sequential domain wall propagation. The boundary between these regimes in electric field--temperature parameter space has not been mapped.